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Alberto Montelongo is a Senior Photo Mask Designer at Polar Semiconductor. Before that, they held positions at Global Foundry, Avera Semiconductors, Marvell, and Intel Corporation as an EDA engineer and Design Automation Engineer. They have a Master of Business Administration in Information Security from Champlain College and a Master of Science in Electrical Engineering and Computer Science from Portland State University. Their expertise lies in developing new process technologies for reticle builds and managing advanced nodes builds and PDK releases.