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Cyrus Tabery is an accomplished professional with extensive experience in semiconductor technology and lithography. Currently serving as a Sr. Principal Architect at ASML since October 2016, Cyrus focuses on research and development in OPC, SEM metrology, and DTCO tools. As an author for SPIE since 1999, Cyrus has contributed numerous articles and engaged in technical presentations at key industry conferences. Previous roles include Design Automation Engineer at Intel Corporation, where Cyrus developed design methodologies and tools, and Senior Member of Technical Staff positions at GLOBALFOUNDRIES and Advanced Micro Devices, where expertise in advanced logic manufacturing and reticle design was honed. Cyrus began the professional journey as a Mask House Intern at IBM, developing lithography processes. Cyrus holds a BS in Chemical Engineering from The University of Texas at Austin, earned between 1997 and 2000.