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Robert D. Clark has extensive work experience in the field of thin film process technologies, high K materials, and advanced gate stacks. Robert D. has worked at TEL Technology Center America as a Sr. MTS and Technology Director, where they led the development of new thin film process technologies and managed technology exchange with key customers and co-development partnerships. Prior to that, they worked as a Principal Process Development Engineer at TEL Technology Center America, where they developed and patented new processes for high K materials and advanced gate stacks. Robert D. also sourced and procured chemical precursors for advanced gate stack materials. Before joining TEL, Robert worked at Schumacher, A Unit of Air Products and Chemicals, Inc as a Principal Research Chemist, where they led the development of multiple deposition processes for high K dielectric and metal electrode films. Robert D. also directed CVD and ALD process development for low K and barrier films. Robert D. started their career at the University of California, Irvine as a student, teaching assistant, and researcher.

Robert D. Clark completed their education with a Bachelor of Science degree in Chemistry from Virginia Polytechnic Institute and State University, which they obtained from 1990 to 1993. Following this, they pursued a Master of Science in Chemistry from the same institution, completing it from 1994 to 1995. Lastly, they earned their Doctor of Philosophy degree in Inorganic/Organometallic Chemistry from UC Irvine, attending from 1995 to 2000.