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Dami Phillips has a diverse work experience spanning various roles in the field of materials science and semiconductor technology. Dami is currently employed as the Lead Research Scientist in Materials Science and AI at NobleAI, starting in 2023. Prior to that, they worked at Lam Research as a Senior Process Engineer, specializing in Advanced Technology Development and New Materials Development. Dami also held the role of Product Engineer in Dielectric Etch at Lam Research.

Before joining Lam Research, Dami worked at BASF as a Product Development and Technology Innovation Manager in the Advanced Materials Division. Dami'sresponsibilities involved managing product development and implementing technology innovation strategies.

Dami began their career as a Graduate Researcher at the Georgia Institute of Technology, where they worked on various projects related to materials synthesis, polymer characterization, and design of polymer-based solutions for semiconductor processes. During their time at Intel Corporation, they held roles as a Dry Etch Equipment Engineer and as a Dry Etch Process Engineer, where they successfully implemented process improvements and reduced tool-related issues. Dami also worked as a Lithography Process Engineer at Intel Corporation, leading projects to resolve defects and implementing improvements across fabrication facilities.

Dami's work experience clearly demonstrates their expertise in materials science, semiconductor technology, and process improvement.

Dami Phillips holds a Bachelor of Science degree in Chemical Engineering from the University of Florida (2008-2013) and a Doctor of Philosophy degree in Chemical Engineering from the Georgia Institute of Technology (2013-2018). Additionally, they have a Master of Science degree in Computer Science - Machine Learning from the Georgia Institute of Technology (unspecified start and end years). Dami also has certifications in Lean Six Sigma Yellow Belt from BASF and Six Sigma Green Belt from the Institute of Industrial and Systems Engineers.