��������

Ikram Ul Huda S. currently serves as Section Lead - Dry Process and Process Engineer at AOI since April 2022, focusing on process ownership for compound semiconductor and dielectric plasma dry etch, thin film metal contacts, and dielectric depositions. Prior experience includes working as a Graduate Research Assistant at the University of Houston from January 2021 to January 2022 in the Computational Catalysis and Interface Chemistry group, contributing to a machine learning database for zeolite frameworks, and in the Selva Research Group from April 2020 to October 2020, where the focus was on advanced materials processing for high temperature superconducting thin film tapes. Ikram Ul Huda S. holds a Master's degree in Materials Science and Engineering from the University of Houston (January 2020 - December 2021) and a Bachelor's degree in Chemical Engineering from Osmania University (August 2015 - May 2019).